Topic Overview The adsorption of organometallic compounds onto semiconductor and silica gel surfaces is a crucial step in a series of reactions involved in film formation and organocatalyst synthesis [1,2]. Physical and chemical analysis of the reaction mechanism can be useful in selecting the optimal starting material molecules, but analyzing the reaction mechanism on various solid surfaces depending on the crystalline phase requires computational resources… Read more: Reaction analysis of TMA in a system simulating a silicon oxide film surface