Publication of Analysis of Surface Reaction Mechanism between ALD Precursor and Substrate

We have published a new Matlantis application case on our Simulation Case Studies page. This case analyzes the surface reactions that occur between the precursor materials of the deposited film and the deposition substrate in Atomic Layer Deposition (ALD), which is a crucial technique in the film formation process for semiconductor manufacturing.

For the full article, click here: Analysis of Surface Reaction Mechanism between ALD Precursor and Substrate